Travelstead Institute Chair, RPI Physics, United States
Gwo-Ching Wang is a Professor of Physics at Rensselaer Polytechnic Institute, specializing in materials physics and surface physics. Over her distinguished career, she has published over 300 articles and authored several books. Wang’s research focuses on the characterization of surface defects, ultrathin films, and thin film stability. She has been instrumental in advancing research in nanostructures and thin film technologies, particularly in the areas of electron diffraction and surface physics. With numerous awards and recognitions, Wang continues to be a pioneering force in her field, making significant contributions to quantum computing, spintronics, and high-performance materials.
Profile
Education
Gwo-Ching Wang’s academic journey began with a B.S. in Physics from Cheng-Kung University in Taiwan (1968). She continued her studies at Northern Illinois University, earning an M.S. in Physics in 1973. She then completed her Ph.D. in Materials Physics at the University of Wisconsin-Madison in 1978. Her diverse educational background has provided her with a strong foundation in experimental physics, particularly in the areas of surface and materials science.
Experience
Professor Wang has held prominent positions throughout her career. Currently, she serves as the Travelstead Institute Professor at Rensselaer Polytechnic Institute, where she has been a faculty member since 1991. From 2000 to 2010, she served as the Head of the Physics Department. Her earlier experience includes positions as a physicist at Oak Ridge National Laboratory and a postdoctoral researcher at the National Bureau of Standards (now NIST). Throughout her career, she has mentored over 250 students in various research programs and has contributed significantly to developing educational resources in physics.
Research Focus
Gwo-Ching Wang’s research primarily revolves around the characterization of ultrathin films, surface defects, and nanostructures using advanced techniques such as Reflection High-Energy Electron Diffraction (RHEED). Her work has significantly impacted the fields of nanotechnology, quantum computing, and spintronics, with a particular focus on the growth, stability, and properties of thin film materials. Her pioneering efforts in studying surface phase transitions, dynamic scaling in film growth, and the magnetic properties of ultrathin ferromagnetic films have contributed to advancements in materials science.
Publications
- Y. Xiang, F.-W. Guo, T.-M. Lu, G.-C. Wang, “Reflection high-energy electron diffraction measurements of 2D materials reciprocal space structure”, Nanotechnology 27, 485703 (2016).
- Zonghuan Lu, Neha Dhull, Xuegang Chen, Lihua Zhang, Kim Kisslinger, Tung-Sheng Kuan, Morris A. Washington, Toh-Ming Lu, Gwo-Ching Wang, “Near surface structure of ultrathin epitaxial Ru films on graphene/amorphous SiO2 revealed by azimuthal RHEED”, J. of Mat. Resch 38, 1224–1238 (2023).
- F. Tang, T. Parker, G.-C. Wang, T.-M. Lu, “Surface texture evolution of polycrystalline and nanostructured films: RHEED surface pole figure analysis”, J. Phys. D: Appl. Phys. 40, R427–R439 (2007).
- Z.H. Lu, X. Sun, Y. Xiang, M.A. Washington, G.-C. Wang, T.-M. Lu, “Revealing the Crystalline Integrity of Wafer-Scale Graphene on SiO2/Si: An Azimuthal RHEED Approach”, ACS Appl. Mater. Interfaces 9, 23081-23091 (2017).
- J. Drotar et al., “Real-time observation of initial stages of copper film growth on silicon oxide using reflection high-energy electron diffraction”, J. Appl. Phys. 96, 7071 (2004).